As New York Fashion Week looms closer and closer, designers as well as models and celebrity stylists will undoubtedly be looking forward to the event.
One person who is most definitely counting down the days is Australian designer Kit Willow, who has spoken to Vogue about her latest collection, which she will soon be sending down the runway.
She said that she was inspired by henna tattoos and the idea of using fabrics to create a "second skin" on the body.
To do this, Ms Willow used stretch organza with fine silk tulle and claimed that women should be wearing clothes that are beautiful, soft, graphic and edgy.
"The sleek silhouette is like a shadow, a perfect eclipse of the feminine form," she added.
We’re so excited about New York Fashion Week as it boasts a whole host of new names this year, alongside well-established favorites like DKNY, Diane Von Furstenburg, Ralph Lauren and Zac Posen.
Do you like Kit Willow’s designs?
Posted by Valerie Lawson
